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Improving hole injection efficiency by manipulating the hole transport mechanism through p-type electron blocking layer engineering

机译:通过p型电子阻挡层工程操纵空穴传输机制来提高空穴注入效率

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摘要

The p-type AlGaN electron blocking layer (EBL) is widely used in InGaN/GaN light-emitting diodes (LEDs) for electron overflow suppression. However, a typical EBL also reduces the hole injection efficiency, because holes have to climb over the energy barrier generated at the p-AlGaN/p-GaN interface before entering the quantum wells. In this work, to address this problem, we report the enhancement of hole injection efficiency by manipulating the hole transport mechanism through insertion of a thin GaN layer of 1 nm into the p-AlGaN EBL and propose an AlGaN/GaN/AlGaN-type EBL outperforming conventional AlGaN EBLs. Here, the position of the inserted thin GaN layer relative to the p-GaN region is found to be the key to enhancing the hole injection efficiency. InGaN/ GaN LEDs with the proposed p-type AlGaN/GaN/AlGaN EBL have demonstrated substantially higher optical output power and external quantum efficiency. © 2014 Optical Society of America.
机译:p型AlGaN电子阻挡层(EBL)广泛用于InGaN / GaN发光二极管(LED)中以抑制电子溢出。但是,典型的EBL也会降低空穴注入效率,因为空穴必须进入p-AlGaN / p-GaN界面产生的能垒上方,然后才能进入量子阱。在这项工作中,为了解决这个问题,我们报告了通过将1 nm的GaN薄层插入p-AlGaN EBL中来操纵空穴传输机制,从而提高了空穴注入效率,并提出了AlGaN / GaN / AlGaN型EBL优于传统的AlGaN EBL。在此,发现插入的薄GaN层相对于p-GaN区域的位置是提高空穴注入效率的关键。具有建议的p型AlGaN / GaN / AlGaN EBL的InGaN / GaN LED已显示出更高的光输出功率和外部量子效率。 ©2014美国眼镜学会。

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